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Schematic of the sample fabrication procedure. A layer of polymethylmethacrylate (PMMA) photoresist is first spin coated on the ITO glass. Nanograting patterns of the PMMA photoresist are fabricated by E-beam lithography. A layer of 56 nm gold thin film is subsequently sputtered on the nanostructure to obtain the structure A (nonlift-off). If the photoresist is removed by a lift-off process, we obtain the structure B (lift-off), which is discrete gold nanostripes.
