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Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
Cross-sectional TEM images of the AgNW network (a) before and (b) after pressurizing with 2000 N/cm2; (c) EDX data of the Ag nanomesh on the SiO2 substrate after pressurizing. A Pt coating was applied after the Ag nanomesh was formed on the SiO2 surface to observe the cross-sectional TEM.