Table 1.
Summary of precursors and references of focused electron beam and focused ion beam-induced deposition (FEBID and FIBID) materials for which mechanical properties were reported. Chemical formulae and abbreviations as used in this article are given as well as the resulting deposit metal content and matrix composition. The maximum achieved metal contents (sometimes with additional co-reactant gases) obtained so far are shown in comparison with the corresponding reference. The abbreviation a-C:H,O,F reads as amorphous carbon being hydrogenated, oxygenated, and/or fluorinated.
| Element with Precursor, Linear Formula, Sum Formula | Abbreviation | Metal (at.%) * | Matrix * | Max Metal Content Reported so far |
|---|---|---|---|---|
| C-FIBID with phenanthrene [36,37,38,39,40,41,42,43,44], C14H10 | C14H10 | 3–25 Ga | a-C:Hx | Up to 25 at% Ga contamination depending on deposition parameters |
| C-FEBID with paraffin (CnH2n+2) [45] : n-docesane C22H46; n-tetracosane, C24H50 | C22H46, C24H50 |
0 | a-C:Hx | Cleanest—no metal in deposit when using FEBID |
| Pt-FEBID and FIBID with Trimethyl- (methylcyclopentadienyl)–platinum [46,47,48,49], (CH3)3Pt(C5H4CH3); PtC9H13 | Pt- (CpMe)Me3 |
10–15 (FEB) Pt/Ga: 42/20 (FIB) [46] |
a-C:Hx | FEB: Pt ≈100 at.% (+H2O) [26] FIB: ≈ 45 at% (5 at.% Ga) [50] |
| W-FEBID and FIBID with Tungsten-hexacarbonyl [51,52], W(CO)6 | W(CO)6 | W/Ga: ≈ 80/18 (FIB) [51] W: 47–62 (FEB) [52] |
FIB: a-C:O, ≈ C85O15 [51] FEB: a-C:O, ≈ C80O20 [52] |
FIB: ≈ 80 at.% W [51] FEB: ≈ 62 at.% [52] |
| Co-FEBID with Dicobaltoctacarbonyl Co2(CO)8 (This work and [52]) | Co2(CO)8 | ≈ 72 (This work) ≈ 42 [52] |
a-C:O, ≈ C67O33 (This work)a-C:O, ≈ C80O20 [52] | Co ≈ 95 at.% (FEB) [21] |
| Au-FEBID with Dimethyl(trifluoro- acetylacetonate)-gold (This work), (CH3)2Au(O2C5H4F3); C7H10AuF3O2 | Au(tfac)Me2 | 50 (FEB) | a-C:O,F,H ≈ C85O20Hx |
FEB: Au 100 at.% (+H2O) [32] |
| Cu-FEB: Copper(II) hexafluoroacetyl- acetonate [53], Cu(C5HF6O2)2; CuC10H2F12O4 | Cu(hfac)2 | 6–10 (FEB) | a-C:O,F,H ≈ C60...70O20..22F4..8Hx |
FEB: ≈ 10 at.% [54] No FIB data |
| Cu-FEBID with hexafluoropentane- dionate-Copper–vinyltrimethylsilane [55], C5H12Si-Cu-C5HF6O2; CuC10H13F6O2Si | (hfac)Cu- VTMS |
14–30 (FEB) | a-C:O,F,H,Si≈ C70O14Si10Hx [56] | FEB: ≈ 95 at.% [57]FIB: ≈ 95 at.% Cu (5 at.% Ga) [58] Both achieved with heating |
| Fe-FIBID with Ferrocene [59], Fe(C5H5)2; FeC10H10 | Fe(Cp)2 | 5 at% Fe (FIB) | a-C:Hx | FEB: 95 at.% with Fe(CO)5 [60,61] |
| SiO2-FIBID with Tetramethylcyclotetra- siloxane [62], (HSiCH3O)4; Si4C4H12O4 | (HSiCH3O)4 | 5 at% Ga [63] | C < AES noise level [63] | FIB: 95 at.% SiO2, 5at.% Ga (+traces of O2) [63] |
| SiO2-FEBID with Tetramethoxysilane (This work), Si(OCH3)4; SiO4C4H12 | Si(OCH3)4 | 33 (FEB) | a-C:H,O ≈ C56O44Hx [34] |
FEB 100 at.% SiO2 (+H2O) [34] |
| Rh-FEBID with Rhodium-tetrakis- chlorotrifluorophosphine (This work), [RhCl(PF3)2]2; Rh2Cl2P4F12 | Rh2Cl2(PF3)4 | 70 (FEB) | a-P:Cl ≈ P77Cl23F0 [64] |
FEB: 60–70 at.% (This work) No FIB data |
* Literature references in these two columns differ from column one (left) when no composition data was found there.