Figure 14.6.

Nanofabricated rack patterns for making “double-tethered” DNA curtains. (A) shows an optical image of a single barrier set and relevant pattern dimensions are indicated. An AFM image of a rack pattern is shown in (B) highlighting the height of the linear barriers and the pentagons as well as the distance between the barrier elements. An SEM image of a rack pattern is shown in (C). Examples of a “double-tethered” DNA curtain stained with YOYO1 are shown in (D) and (E). The “double-tethered” curtain shown in (D) was made by ebeam lithography, and the curtain shown in (E) was made by nanoimprint lithography. Adapted with permission from Gorman et al. (2010).