Figure 1.

(a) Sideview of the ion beam assisted electron beam deposited (IBAD) indium tin oxide (ITO) MEA structure. The image is not to scale. The structure is the same in each batch and version except that the thickness of the ITO track (grey) and/or its deposition method are varied in different batches and the existence or thickness of the TiN coating (green) is varied in different versions. See Table 1 and Table 2 for more details. (b) Photograph of an IBAD ITO MEA with a polydimethylsiloxane (PDMS) microfluidic device. The dimensions of the glass substrate are 49 mm × 49 mm.