Table 3.
Impedances at 1 kHz and estimates of RMS noise level and sheet resistance. In the normalized column the impedances of 35 × 50 µm2 electrodes are normalized to correspond to the area of Ø30 µm electrodes.
| Batch/ Version |
ITO Deposition Method | ITO Thickness (nm) | TiN Thickness (nm) | Measured Impedance of Ø30 µm Electrodes (kΩ) |
Measured Impedance of 35 × 50 µm2 Electrodes (kΩ) |
Normalized Impedance (kΩ) | RMS Noise (µV) | ITO Sheet Resistance (Ω/□) |
|---|---|---|---|---|---|---|---|---|
| 1/1 | IBAD | 20 | - | 1200 ± 260 | 820 ± 140 | 2030 | 12 ± 1 | 2.6 × 103 |
| 2/1 | IBAD | 20 | - | 1950 ± 810 | 1170 ± 120 | 2900 | Na | 9.4 × 106 |
| 3/1 | IBAD | 150 | - | 1940 ± 290 | 1180 ± 150 | 2920 | Na | 76.4 × 103 |
| 4/1 | Sputtering | 180 | - | 1420 ± 170 | 830 ± 30 | 2050 | Na | 8–10 * |
| 2/1 | IBAD | 20 | 40 | 320 ± 20 | 190 ± 10 | 470 | 6.1 ± 0.5 | 2.6 × 103 |
| 2/2 | IBAD | 20 | 40 | 370 ± 10 | 150 ± 10 | 370 | na | 9.4 × 106 |
| 3/2 | IBAD | 150 | 40 | 350 ± 10 | 160 ± 3 | 400 | na | 76.4 × 103 |
| 4/2 | Sputtering | 180 | 40 | 300 ± 10 | 130 ± 2 | 320 | na | 8–10 * |
| 1/3 | IBAD | 20 | 200 | 190 ± 10 | 150 ± 20 | 370 | 5.6 ± 0.5 | 2.6 × 103 |
| 2/3 | IBAD | 20 | 200 | 240 ± 10 | 120 ± 2 | 300 | na | 9.4 × 106 |
| 3/3 | IBAD | 150 | 200 | 210 ± 4 | 110 ± 2 | 270 | na | 76.4 × 103 |
| 4/3 | Sputtering | 180 | 200 | 190 ± 3 | 90 ± 1 | 220 | na | 8–10 * |
* Data from supplier (University Wafer Inc.).