Table 2.

Influence of bases on the photoredox trifluoromethoxylation in batch and flow.

Entry	Equiv of substrate	Сonc. of 1 (M)	Base	Yield (%)a
organic/soluble bases
1	10	0.08	(Bu4N)H2PO4, 1 equiv	20
2	10	0.08	(Bu4N)H2PO4, 1 equiv	6 (flow)
3	25	0.04	DIPEA, 1 equiv	18
4	25	0.04	DBU, 1 equiv	14 (flow)
5	25	0.04	(Bu4N)OAc, 1 equiv	0 (flow)
inorganic bases
6	25	0.04	K2CO3, 1 equiv	54
7	25	0.04	K2HPO4, 1 equiv	86
8	25	0.04	K2HPO4, 1 equiv	7b (flow)
9	10	0.04	K2HPO4, 1 equiv	68
10	10	0.08	K2HPO4, 1 equiv	78
11	10	0.08	K2HPO4, 0.5 equiv	78
12	10	0.08	K2HPO4, 0.25 equiv	77
13	10	0.08	K2HPO4, 2 equiv	70
14	10	0.08	KH2PO4, 1 equiv	89
15	10	0.08	KH2PO4, 1 equiv	75c (flow)
16	10	0.08	KH2PO4, 0.5 equiv	64
17	10	0.08	KH2PO4, 0.25 equiv	63
18	10	0.08	KH2PO4, 2 equiv	78
19	10	0.08	K3PO4, 1 equiv	54

^{a 19}F NMR yields are reported; ^b 100 equiv of H₂O added; ^c 5 minutes of irradiation in batch before flow reaction.