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Schematic illustration of (a,b) Patterned and asymmetrical UV exposure on NIL thiol-acrylate structure. (c) SEM micrographs of the topography of needle-like micropatterns inscribed by visible light assisted NIL (d) Surface structures of the photocured photopolymer after 1500 s of UV exposure (269 mW/cm2) under air (Adapted from reference [90] published by the Royal Society of Chemistry).
