Figure 17.

Schematic representation of the formation of a positive-tone resist and (a) subsequent removal of the resist by hydrolytic degradation of the PDMS network. (b and c) Confocal micrographs of positive-tone relief structures (100 μm lines and spaces) inscribed into PDMS-1 by photolithography after the development in chloroform. (d) Schematic representation of the formation of a negative-tone resist. (e and f) Confocal micrographs of negative-tone relief structures (50 and 100 μm lines and spaces) inscribed into polymer network by photolithography after the development in 1 M aqueous NaOH (Reprinted with permission from reference [134]).