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. 2020 Jul 13;9:119. doi: 10.1038/s41377-020-00362-z

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© The Author(s) 2020

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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Fig. 5 — a Sketch of the optical system. S: the plane on the panel of the SLM. P: the focal plane of Lens 1. E: the entrance pupil of the objective. F: the focal plane of the objective. (b) CGH displayed on the SLM for the generation of a 9 × 9 foci array. c The foci array on the focal plane of Lens 1 (P-plane). d Phase distribution and e intensity distribution on the entrance pupil of the objective (E-plane). f Simulated and g measured multi-foci array generated on the focal plane of the objective (F-plane). h Enlarged intensity profile of a single focal spot in the array. The arrows indicate the polarization directions. i Longitudinal intensity profile and corresponding line plot of the foci array. j Simulated and k measured intensity distribution on the F-plane when the CGH for the generation of the pattern “E” is encoded on the SLM. l, m Enlarged intensity profiles of the pattern corresponding to (j) and (k) with the same sampling points as in (i)