| Tg | Glass transition temperature [°C] |
| α | Laser absorption coefficient |
| αeff | Effective coefficient of laser absorption |
| n | Reflective index |
| R | Coefficient of reflection |
| Rp | Polarization resistance [Ω/cm2] |
| κ | Extinction coefficient |
| λ | Light wavelength [nm] |
| I | Laser radiation intensity [W/sr] |
| I 0 | Intensity of incident laser radiation [W/sr] |
| i | Plating process rate [s] |
| Eth | Ablation threshold [J/cm2] |
| Ej | Energy per laser pulse [J/cm2] |
| Ea | Activation energy for ablation [J/cm2] |
| φ | Quantum yield of bond breaking (0 to 1) |
| hν | Photon energy [eV] |
| TD | Threshold ablation temperature [°K] |
| TR | Initial temperature [°K] |
| Cw | Specific heat of polymeric materials [J/kg·K] |
| L | Ablation depth [mm] |
| Lchem | Photochemical ablation depth [mm] |
| Ltherm | Photothermal ablation depth [mm] |
| ba, bc | Tafel equation coefficients |
| v | Dependence of deposition rate [dm2/L] |