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. 2020 Jun 29;20(13):3639. doi: 10.3390/s20133639

Table 1.

Step by step procedures for the fabrication of the low-power, wireless optoelectronic devices.

Process Purpose Equipment/Tools (Model Name/Manufactures) Progress 1
1. Preparation of Cu/PI film Preparation of the films for defining patterns PI/Cu film (AC181200R, DupontTM Pyralux®)
glass
Kapton tape
5%
2. UV photo-lithography Define the patterns Cleanroom (AggieFab)
Spin-coater (G3 P-8, Specialty Coating Systems)
Hotplate (SP88850200, Fisher ScientificTM)
Mask aligner (EVG®610, EV Group)
Photoresist (AZ 1518, AZ®)
Developer (AZ Developer 1:1, AZ®)
Copper etchant (Alfa Aesar™)
30%
3. Components soldering Mount electrical components on the pattern Microscope (SPZV 50E, AVEN)
Solder cored wire flux (397952, Multicore®)
Solder stations (WD1002/WP80, Weller)
Stainless steel wire (75,000 psi tensile strength, and 0.008’’ diameter, McMaster-Carr)
UV epoxy (MED-OG198-54, Epoxy Technology)
60%
4. 1st testing Function verification Transmit power system (FEIG electronic)
Magnets
70%
5. PDMS encapsulation Device packaging Vacuum ovens (Accu Temp 1.9, AI)
PDMS (SylgardTM 184 silicone elastomer kit, Dow®)
95%
6. 2nd testing Device validation Transmit power system (FEIG electronic)
Magnets
100%

1Progress (%) is based on the step-wise required time per total required time.