Fig. 6.

Schematic illustration of the fabrication process (a) of the soft PDMS stamp based on electron beam lithography in a PMMA resist and casting of a hard PDMS/PDMS bilayer, (b) of the graphene nanomesh based on soft UV nanoimprint lithography in an Amonil/Ge/PMMA trilayer transferred by reactive ionic etching. Republished with permission of Royal Society of Chemistry, from Large area graphene nanomesh: an artificial platform for edge-electrochemical biosensing at the sub-attomolar level (Zribi et al., 2016); permission conveyed through Copyright Clearance Center, Inc.