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. 2020 Jul 22;10:12183. doi: 10.1038/s41598-020-68293-8

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© The Author(s) 2020

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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Polarized optical microscopy (POM) images (a–f) and the crystal area coverage (g) of PLA/rubrene crystal films obtained by spin-coating different concentration rubrene solutions on 57.2 nm PLA modified FTO wafers after the solvent vapor annealing procedure (the 57.2 nm PLA modified FTO wafers were fabricated by spin-coating the PLA solutions on fluorine-doped tin-oxide (FTO) coated glass wafers, and the concentrations of rubrene solutions were a 0, b 1, c 3, d 5, e 7, and f 9 mg/mL, respectively).