Table 1. Beamline components on P06 and their distance from the centre of the undulator [updated from (Schroer et al., 2016 ▸)].
Beamline component | Position (m) |
---|---|
U32 undulator | 0.00 |
Vertical high-power slit PS1 | 18.91 |
High-power slits PS2 | 26.69 |
Multilayer monochromator (MLM) | 35.81 |
Si monochromators, DCM and CCM | 38.40 |
Beam position monitor QBPM mono | 39.34 |
Retractable screen LM2 | 39.51 |
First HO mirror | 40.78 |
Second HO mirror | 41.78 |
Refractive X-ray lenses (Si lenses) | 42.61 |
Retractable screen LM2b | 42.69 |
Optical hutch (OH) slits | 42.95 |
43.35 | |
Refractive X-ray lenses CRLs | 43.54 |
Retractable screen LM3 | 44.66 |
Retractable screen LM4 | 86.66 |
Beam position monitor QBPM micro | 86.83 |
Fast shutter | 87.39 |
Absorber unit | 87.75 |
Scanner unit entrance slits | 97.35 |