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. 2020 Jul 2;10(7):1300. doi: 10.3390/nano10071300

Figure 20.

Figure 20

Schematic diagram part fabrication process: Mixing of SiO2, GNPs and R-F with the aqueous GO suspension. Then, the as-prepared GO paste was extruded in an isooctane bath, and the as-obtained part was gelled at 85 °C, then dried using supercritical carbon dioxide. Finally, the silica fillers were etched using diluted hydrofluoric acid. The scale bar is 10 mm. Reprinted Reproduced from [213], with permission from American Chemical Society, 2016.