Table 3.
Material | Method | Electrolyte | Eonset (V)/E ½ (V) @ 1600 RPM | Jl/n @ 1600 RPM |
Ref. |
---|---|---|---|---|---|
3D Pd/rGO | Hydrothermal/PdCl2 and glucose | 0.1 M KOH | Eonset = 0.90 V Vs RHE | Jl = −3.7 mA cm−2 | [33] |
3D N-graphene | Hydrothermal self-assembly (ascorbic acid)/C3N4 and urea/N = 4.94 at % | 0.1 M KOH | Eonset = 0.88 V/E1/2 = 0.81 Vs RHE | Jl = 5.21 mA cm−2/ n = ~3.4 (catalyst loading 0.1 mg cm−2) |
[58] |
3D N-graphene aerogel | Ascorbic acid-hydrothermal assembly/Pyrolysis, Polyallylamine/N = 2.07 at % | 0.1 M KOH | E1/2 = −0.77 V Vs RHE | Jl = 5.7 mA cm−2/(catalyst loading 0.102 mg cm−2) | [105] |
Pd−N/3D graphene | Silica template assisted/surfactant free Pd deposition/N=3.5 at %/30 wt % Pd (XPS = 2.2 at %) | 0.1 M NaOH | Eonset = 1.0 V Vs RHE | Jl = 5.8 mA cm−2/n = ~ 4 | [106] |
N, B-graphene aerogel | Hydrothermal (NH4B5O8) | 0.1 M KOH | Eonset = −0.05 V/E1/2 = −0.2 V Vs Ag/AgCl | Jl = 5.7 mA cm−2 (catalyst loading 0.14 mg cm−2) | [107] |
N, S-flexible 3D graphene | Thermal treatment by self-assembly approach/3-Amino- benzenesulfonic acid | 0.1 M KOH | Eonset = −0.13 V Vs Ag/AgCl | Jl = −3.72 mA cm−2 | [98] |
3D N-S-graphene aerogel | Hydrothermal self-assembly (ammonia and sulfur powder)/N-5.7 at %; S-4.5 at % | 0.1 M KOH | E1/2 = −0.21 V Vs Ag/AgCl | NA | [108] |
Ag/3D N-G-Aerogel | Hydrothermal self-assembly | 0.1 M KOH | Eonset = 0.97 V/E1/2 = 0.81 Vs RHE | Jl = 5.25 mA cm−2 (catalyst loading 0.128 mg cm−2) | [109] |
3D N- graphene encapsulated Ni-Fe | Hydrothermal assembly/pyrrole/N-6.4 at % | 0.1 M KOH | Eonset = 0.93 V/E1/2 = 0.80 V Vs RHE | NA | [61] |
Mn3O4 nanowire/3D graphene/SWCNT | CTAB assisted microwave irradiation method | 0.1 M KOH | Eonset = −0.048V/E1/2 = −0.15 V Vs Ag/AgCl | n = ~4 | [62] |
NiCo2O4 on graphene foam | Ni foam template-assisted CVD/Chemical synthesis (NH4F and urea) | 0.1 M KOH | E1/2 = 0.86 V Vs RHE | Jl = 6.25 mA cm−2/n = 4 (catalyst loading 0.4 mg cm−2) |
[110] |
MnCo2O4 NP/3D graphene | Template method/Coal tar pitch/hydrothermal method | 0.1 M KOH | Eonset = 0.98 V Vs RHE/E1/2 = 0.81 /n = 4 | NA | [111] |
Spinel CoFe2O4/3D graphene | Templated method/coal tar pitch /Hydrothermal | 0.1 M KOH | E1/2 = 0.80 V Vs RHE | n = ~4 | [112] |
N-IC-rGO | Streamlined Hummers method/hydrothermal method (NH4F)/N = 4.74 at % | 0.1 M KOH | Eonset = −0.05 V/ E1/2 = −0.18 V Vs Ag/AgCl | Jl = 2.9 mA cm−2/n = approximately 4 (catalyst loading 0.21 mg cm−2) | This work |
Pd-N-IC-rGO | Streamlined Hummers method/hydrothermal method (NH4F)/surfactant-free Pd deposition | 0.1 M KOH | Eonset = 0.02 V/ E1/2 = −0.16 V Vs Ag/AgCl | Jl = 3.34 mA cm−2/n = approximately 4 (catalyst loading 0.21 mg cm−2) | This work |