Figure 6.

Thermal oxidation of a single MoS₂ flake at high relative humidity. (A,B) show AFM contact mode topography of an oxidized flake and a close-up on a particular spot, which was scratched out later, in (C). Flake thickness depending on a spot was between 90 to 100 nm. The flake was thermally oxidized for 5 min at RH = 80 ± 7% and at a mean temperature of 205 °C. An average thickness of the scratched out layer in (C) was 2.2 ± 0.2 nm. Z-scales: (A) 274 nm; (B) 64 nm; (C) 42 nm.