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. 2020 Feb 7;33(2):479–490. doi: 10.1007/s12028-019-00911-4

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© The Author(s) 2020

Open AccessThis article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/.

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Fig. 1 — Full montage and reduced montage electroencephalogram construction. Electrodes used to construct bipolar anterior-posterior montages for conventional full montage (A) and reduced montage (B) electroencephalography (EEG), referred to as fm-EEG and rm-EEG, respectively. A sample of rm-EEG (C) showing burst suppression activity is shown, indicating the electrodes used to construct the montage. Readers could adjust display epoch time, scale, and high- and low-pass filters while reviewing EEGs in Phase I, but were not allowed to re-montage the EEG. Readers could not adjust any display settings in Phase II