Figure 2.

Surface chemical and electrical analysis. a) XPS peak of Sb 3d_5/2 obtained from the surface of as‐deposited Sb₂Se₃. b) AFM image of the as‐deposited Sb₂Se₃ surface, and c) is the corresponding KPFM image obtained by scanning the same area. d) XPS peak of Sb 3d_5/2 obtained from the surface of Se‐modified Sb₂Se₃. e) The AFM image of the Se‐modified Sb₂Se₃ surface, and f) the corresponding KPFM image obtained by scanning the same area. g) Potential profiles obtained along the two lines indicated in (c) and (f). Schematic diagrams of surface band bending of h) an as‐deposited Sb₂Se₃ film and i) a Se‐modified Sb₂Se₃ film.