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. 2020 Jul 6;81(5):340–349. doi: 10.1007/s00056-020-00238-2

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© The Author(s) 2020

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/.

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Fig. 3 — Radiographic measurement on lateral cephalogram (a, b) and the corresponding CBCT scans (c, d). Line a distance from the implant tip to the nasal floor at the right angle to the hard palate; line b straight distance from the implant tip to the nasal floor; line c posterior distance from the implant shoulder to the anterior hard palate and angle α: angle between the implant and palate plane (ANS-PNS)

Radiologische Messungen in der Fernröntgenseitenaufnahme (a, b) und den korrespondierenden DVT (digitale Volumentomographie)-Aufnahmen (c, d). Linie a Abstand von der Implantatspitze zum Nasenboden im rechten Winkel zum harten Gaumen; Linie b gerader Abstand von der Implantatspitze zum Nasenboden; Linie c hinterer Abstand von der Implantatschulter zum harten Gaumen, Winkel α: Winkel zwischen Implantat und Gaumenebene (ANS-PNS)