Figure 7.
(a) Spatially confined dehalogenation of α-bromoisobuty-rate-functionalized silicon substrates by irradiation through a binary photomask with 20 × 200 μm2 clear rectangles, followed by subsequent homogeneous irradiation and light-mediated polymerization of MMA. (b) Optical micrograph (left) of the resulting patterned PMMA brushes confirmed the absence of polymer growth within the dehalogenated rectangles. AFM (right) indicated 15 nm polymer brush height and provided additional evidence for the absence of polymer in dehalogenated areas. SIMS chemical maps for (c) silicon and (d) carbon fragments confirmed spatially confined polymerization. All scale bars are 50 μm.