Figure 2.

Optical and thermal fields used in laser annealing. (a) 2D optical profile of the laser line recorded at the sample position. (b) Transverse profile of illumination intensity profile, integrated over a 2-mm-wide central portion of the line. A fit to a Gaussian function is shown in red. (c) Silicon surface temperature profile across the laser line at 27 W of incident power recorded in vacuum. Data points obtained by melt-mark analysis and conventional thermocouple measurements are marked by black and blue circles, respectively. The red line is a guide to the eye. Full-width at half-maximum parameters are provided for both optical and thermal profiles.