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. 2020 Aug 25;53(17):7601–7612. doi: 10.1021/acs.macromol.0c01205

Figure 2.

Figure 2

XRR curves of the 48 nm thick c-PNDG (red circles) and l-PNDG (blue triangles) films prepared on Si substrates after thermally annealed at 200 °C for 15 h. The solid black line corresponds to the best-fits of the electron density (ρe) profile against the distance (z) from the Si surface shown in the inset.