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. 2020 Sep 18;14(5):054102. doi: 10.1063/5.0022767

FIG. 5.

FIG. 5.

Fabrication process steps for the [(a)–(d)] patterning of SRRs and loop antennas, [(e)–(h]) the microchannels, and (i) the bonding of microchannels onto the surface of the glass substrate and SRR/loop antenna couples. (a) Spin-coating of photoresist on the glass substrate following surface treatment. (b) Photolithographic patterning of the photoresist. (c) Physical vapor deposition of adhesion promoting 10 nm Cr, followed by deposition of 300 nm Au. (d) Removal of sacrificial elements. (e) Spin-coating of SU-8 on silicon wafer. (f) Patterning of SU-8 with conventional photolithography to form the casting mold. (g) Pouring of the PDMS/curing agent mixture onto the mold, followed by degassing and curing. (h) Cutting and puncturing of the formed microchannels. (i) Methanol mediated alignment of microchannels on resonators and plasma activation bonding of microchannels on glass substrates.