Fluorescence intensity as a function of delay between TBA–15 probe grafting and hybridization when Si/SiO2 (100 nm) substrates functionalized by UV-assisted GOPS protocol are kept in ambient conditions. (a) Typical epifluorescence microscopy images when the hybridization with the complementary strand (cTBA) was conducted at different times after the TBA–15 grafting (immediately after, 1 day, 2 days, and 3 days after). (b) Fluorescence intensity, as measured on fluorescence micrographs, as a function of delay between TBA–15 probe grafting and hybridization. For all conditions, three fluorescent spots on the substrate were analyzed giving an average fluorescence intensity value and error bars corresponding to the minimum and maximum fluorescence intensity found for each sample.