Table 3.
Substratum Material | Natural Templates | Fabrication Method | Geometrical Features | Wettability | Bactericidal Efficacy | Lethality | Reference |
---|---|---|---|---|---|---|---|
Silicon | Dragonfly | Reactive-ion beam etching | Height 500 nm | Hydrophilic Contact angle 80° |
Killing rate P. aeruginosa: 4.3 × 105 per cm−2min−1 S. aureus: 4.5 × 105 per cm−2min−1 B. subtilis: 1.4 × 105 per cm−2min−1 |
Gram-negative bacteria Gram-positive bacteria Spores |
[62] |
Silicon | Dragonfly | Deep reactive ion etching | Height 4 μm Diameter 220 nm |
Hydrophobic Contact angle 154° |
86% of S. aureus and 83% of E. coli were non-viable after 3 h incubation | Gram-positive bacteria Gram-negative bacteria Mammalian cell |
[66] |
PMMA | Cicada | Soft lithography | Height 210–300 nm Spacing 100–380 nm Width 70–215 nm |
N/A | E. coli: 16–141% higher dead fraction than a flat film | Gram-negative bacteria | [67] |
Silicon | Cicada | Metal assisted etching | Height 200 nm Pitch 200 nm Width 150 nm |
E. coli: 24 h from 3.9 × 106 CFU/mL to 1 CFU/mL | Gram-negative bacteria | [68] | |
Quartz | N/A | Nanosphere lithography | Height 300 nm Apex diameter 10 nm |
Hydrophilic Contact angle ~ 0° |
Kill ~38,000 P. aeruginosa and ~27,000 E. coli cm−2min−1 | Gram-negative bacteria | [69] |
PMMA | Moth-eye | Thermal polymer nanoimprint | Height 350 nm Width 80 nm Pitch 250 nm Aspect ratio 4.3 |
Hydrophobic 135 ± 4° |
Percentage of non-viable bacteria are 55%, 45%, 30% for S. aureus, E. coli, and P. aeruginosa respectively | Gram-positive bacteria Gram-negative bacteria |
[70] |
Silicon | Cicada | Deep ultraviolet immersion lithography Plasma etching |
Diameter 35 nm Periodicity 90 nm Increasing height 220, 360, 420 nm |
N/A | 360 nm-height 95 ± 5% P. aeruginosa and 83 ± 12% S. aureus cell death | Gram-negative bacteria Gram-positive bacteria |
[59] |