Table 3.
Different methods for fabrication of MNAs along with advantages and disadvantages of each method.
Methods | Description | Advantageous | Disadvantageous | Ref(s) |
---|---|---|---|---|
Micromilling | Uses cutting tools to fabricate microscale arrays | Cost effective start-up, high resolution, and versatility about characteristic geometries and material choices | Require burrs removal, damage to the micro-tools, poor surface quality | [66] |
Direct laser micromachining | Molding of materials into desired morphology and dimension by laser | Simple, quick, precise method to handle, no contaminations, delicate designs on different metals, | High power consumption, burning or of the metal, side effects against human, not applicable for thick metals | [67] |
Chemical wet etching | Chemical process for removing the surface layers | Simple equipment, high rate, high selectivity | Needs large amounts of chemicals | [68] |
Electrical discharge machining | A device like MNA is fabricated by applying electrical discharges | Fabrication of complex shapes, high tolerance, Material hardness is not a concern, no distortion, well suited for delicate or fragile parts | Requires conductive materials, cost effective | [69] |
Drawing lithography | A strategy (thermal, magnetorheological, UV, air blowing) for the construction of a MNAs directly from 2D planar polymers | Fabrication of ultrahigh-aspect ratio (UHAR), stepwise controlling, fabrication of hybrid electro-MN | Long drawing time, expensive, not applicable in producing complex shapes | [21], [70] |
UV-lithography | A fabrication strategy based on the pattern parts of a thin film of an agent | Cost effective, production of smaller feature size | Increased cost for new technology, complexity, concern about the reliability | [71] |
Deep reactive-ion etching | Plasma process for production of microstructure of silicon | Modifications can be made, creates a protective layer on the surface, creation of high sidewall angles | Requires suitable etch gasses, contamination of etch processes, requirement for dedicated machines | [72] |
Projection-based direct light processing | A layer-by-layer strategy for fabrication of MNAs | Simple and rapid fabrication of 3D structures | Not high-quality MNAs, not convenient for large scale-up production | [73] |
Fused filament fabrication (FFF) or fused deposition modeling (FDM) | Joint a filament of a material with the same material by heat or etc. | Uses low cost materials, fabricate more complex shaped MNAs | Resolution limitations, two-step process | [74] |
Scanning-based SLA | Laser beam tracks and draws each layer into resin layer | Simple and rapid fabrication of 3D structures | Not high-quality MNAs, not convenient for large scale-up production | [75] |