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Experimental parameters used in magnetron sputtering system for catalyst seed deposition.
| Catalyst | Ar Flow (SCCM) | Pressure (10−3 mbar) | Magnetron Power (W) | Deposition Time (s) |
|---|---|---|---|---|
| Gold (Au) | 7 | 5 | 75 | 5 |
| Platinum (Pt) | 7 | 5 | 75 | 2 |
| Silver (Ag) | 7 | 5 | 50 | 5 |
| Cooper (Cu) | 7 | 5 | 50 | 15 |
