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. 2020 Oct 9;10(10):1990. doi: 10.3390/nano10101990

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© 2020 by the authors.

Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).

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Sequence of atomic layer deposition (ALD) process including sub-cycles for bismuth and iron (a), and a sample with dimensions of 7 mm x 7 mm and an SPM-scanned image of a portion of the sample surface (b).

Sequence of atomic layer deposition (ALD) process including sub-cycles for bismuth and iron (a), and a sample with dimensions of 7 mm x 7 mm and an SPM-scanned image of a portion of the sample surface (b).