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. 2020 Oct 28;6(44):eabb0025. doi: 10.1126/sciadv.abb0025

Fig. 2. Fabrication process of LOIS and its characterization.

Fig. 2

(A) Schematics of the four-step fabrication process of LOIS. The inset shows the SAM formed on the substrate. (B) SEM and AFM images for optimization of the micro/nanostructure of the substrate in different etching time. X-ray photoelectron spectroscopy (XPS) spectra of the (C) Cr2p and (D) F1s after surface passivation and SAM coating. a.u., arbitrary units. (E) Representative images of water droplet on bare, etched, SHP, and LOIS substrates. (F) Contact angle (CA) and SA measurement of liquids with different surface tension on SHP and LOIS. Data are presented as means ± SD.