Skip to main content
. Author manuscript; available in PMC: 2023 May 28.
Published in final edited form as: Nat Phys. 2022 Nov 28;19:132–141. doi: 10.1038/s41567-022-01826-2

Extended Data Fig. 6. Activity and tension drives hole formation.

Extended Data Fig. 6

(a) Inhibition of arp2/3 by 100 μM CK666 treatment prevents hole formation on 2.3 kPa gels (Scale: 100 μm) (b) Number of holes/mm2 under control, CK666 and blebbistatin (5μM) treated samples averaged over n=33 for control, n = 24 for CK666 and n=23 for blebbistatin (****p < 0.0001) (c) Area of holes formed under control (n=49) and 5μM blebbistatin treated (n=14) samples (d) Averaged velocity profile around +1/2 defects with CK666 treatment (left) (nCK666=2294) and WT (right) (nWT=2646) monolayers on soft (2.3kPa) gels (e) Simulations with a lower active stress (left; n = 4750 defects) as compared to the control case (right; n = 8553 defects, soft gel set of parameters, Table 1 SI).