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Spectroscopic characterization of an MLG infrared device. (a) In situ Fourier-transform infrared spectroscopy (FTIR) characterization of a device at increasing voltage (from 0 to 3.8 V). (b) Voltage dependence of thermal emissivity of the surface for MWIR (3–5 μm) and LWIR (8–12 μm) ranges and with stage recovery after intercalation.
