Figure 1.

t-SPL based strain nanopatterning in 2D materials (2DMs). (a) Conceptual illustration of the thermomechanical nanoindentation process for strain nanopatterning in the 2DM, such as TMDCs or graphene. Drawing is not to scale. (b) Cross-section scheme showing details of the heated nanotip indenting a monolayer TMDC layer on a PPA layer. Drawing is not to scale. (c) AFM topography of the written MoS₂ ripple nanostructures. (d) Three-dimensional representation of the area marked in panel c. (e) Depth profile of the selected line in panel c. The nanoindentation depth is around 4 nm and the pileup height is around 1.5 nm.