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Schematic illustration of roll-to-roll manufacturing and modification strategy of multifunctional TEMPO-CNF films combining nanoimprint lithography (NIL) to create micropillar patterns and plasma-enhanced chemical vapor deposition for simple interfacial modification using APTES and HMDSO as precursors. Photographs showing initial appearance of nanocellulose gel that forms a transparent continuous film upon drying. SEM image illustrates features of NIL surface-patterned TEMPO-CNF film.
