Table 1. Photocatalytic Production of H2O2.
| entry | material | H2O2 production rate | irradiation conditions | solvent system | reference |
|---|---|---|---|---|---|
| 1 | g-C3N4 | 63.00 μmol h–1 gcat–1 | λ = 420–500 nm | H2O:EtOH (1:9) | (22) |
| 2 | g-C3N4/PDI-BN0.2-rGO0.05 | 30.80 μmol h–1 gcat–1 | λ > 420 nm | H2O | (37) |
| 3 | PEI/C3N4 | 208.10 μmol h–1 gcat–1 | solar simulator (AM = 1.5) | H2O | (38) |
| 4 | Si/TiO2-Au | 14.80 μmol h–1 | λ = 365 nm | 0.01 M HCl, Y3+ cocatalyst | (39) |
| 5 | g-C3N4/AQ-COOH | 361.00 μmol h–1 gcat–1 | λ > 400 nm | propan-2-ol/H2O (1:9) | (40) |
| 6 | g-C3N4/rGO (10 wt %) | 74.30 μmol h–1 gcat–1 | λ > 400 nm | propan-2-ol/H2O (1:9) | (40) |
| 7 | boron nitride quantum dots–carbon nitride (BNQD/UPCN) | 72.30 μmol h–1 gcat–1 | λ > 420 nm | propan-2-ol/H2O (1:9) | (41) |
| 8 | C-N-g-C3N4 | 0.98 μmol h–1 gcat–1 | 420 < λ < 700 nm | H2O | (42) |
| 9 | OPA/Zr92.5Ti7.5-MOF | 9700.00 μmol L–1 h–1 | λ > 420 nm | benzyl alcohol:H2O (2.5:1) | (20) |
| 10 | resorcinol–formaldehyde resins | ∼40.00a μmol h–1 | λ > 420 nm | H2O | (43) |
| 11 | TAPD-(Me)2 COF | 97.00 μmol h–1 gcat–1 | λ = 420–700 nm | H2O:EtOH (9:1) | this work |
| 12 | TAPD-(OMe)2 COF | 91.00 μmol h–1 gcat–1 | λ = 420–700 nm | H2O:EtOH (9:1) | this work |
| 13 | TAPD-(Me)2 COF | 234.52 μmol h–1 gcat–1 | λ = 420–700 nm | H2O:EtOH (1:9) | this work |
a
Extrapolated from graph.