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a) Schematic representation of CH4 oxidation on a silica surface under deep UV light. b) 165 nm photoreactor consisting of 1. deuterium lamp, 2. MgF2 window, 3. gas chamber, and 4. photocatalyst. c) 185 nm photoreactor, 1. Hg lamp, 2. synthetic quartz window, and 3. gas chamber, wherein photocatalyst was placed. Reproduced with permission.[ 145 ] Copyright 2011, American Chemical Society.
