Skip to main content
. 2020 Nov 23;5(48):31432–31439. doi: 10.1021/acsomega.0c05049

Table 2. Bonding Analysis (EDA) of 3 and TS with and without N(CH3)3a.

bonding analysis (EDA) 3 TS TS + N(CH3)3
ΔEint –308   –152   –193  
ΔEint(disp)b –12 4% –13 9% –21 11%
ΔEint(elec)b –296 96% –138 91% –172 89%
ΔEPauli 1742   852   957  
ΔEelstatc –885 43% –479 48% –560 50%
ΔEorbc –1153 57% –511 52% –569 50%
ΔEorb(S–N)d –971 84% –402 79% –466 82%
ΔEorb(NH--F)d     –55 11% –34 6%
ΔEorb(rest)d –182 16% –54 11% –69 12%
ΔEprep 15   260   266  
ΔEbond –293   108   72  
a

All energies in kJ/mol at PBE/TZ2P. Fragments for 3 are generated from homolytic cleavage at N–S into neutral doublets. For the TS, the reactants are used as fragments in a neutral, singlet configuration.

b

Percentage values: Relative contributions of dispersion and electronic effects to the interaction energy ΔEint.

c

Percentage values: Relative contributions between the attractive EDA terms ΔEelstat and ΔEorb.

d

Percentage values: Relative contributions to the orbital interaction ΔEorb. The character of the orbital contribution as S–N bond or NH--F hydrogen bond is revealed by NOCV analysis, as shown below. Non-assignable contributions are summed in the “rest” term.