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XRD patterns of: A(metallic Ti)—metallic Ti layer of 100 nm thickness, which was formed by magnetron sputtering; B(TiO2−x/TiO2-structure)—TiO2−x/TiO2(400 °C)-based heterostructure, which was formed from above mentioned metallic 100 nm thick Ti layer; C(TiO2 powder)—TiO2-powder, which was used as ‘control sample’ and by supplier (Sigma-Aldrich) was declared as 99.3% TiO2 in anatase phase. Figure adapted from [1].
