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. 2020 Nov 28;10(12):2367. doi: 10.3390/nano10122367

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© 2020 by the authors.

Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).

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(A) TG and corresponding (B) DTA traces for 50Si·50BiF₃ in heated at 5 K/min in oxidizing and inert environments. The oxidative TG runs for 1-stage 50Si·50BiF₃ and milled Si are also shown.