Table 3.

Summary of the reported NO₂ sensor based on the MoS₂

Sensing film	Type	Method	Def.	Electrodes	Device	Conc. (ppm)	Tem. (°C)	S (%)	Res time	Rec time	References
1L MoS2	n	M.E.	$\left(\frac{\left(I_{\text{gas}}-I_{\text{air}}\right)}{I_{\text{air}}}\right)$	Ti/Au	FET	2	RT	80	–	–	[34]
MoS2 sheets	p	E.L.	$\left(\frac{\left(R_{\text{gas}}-R_{\text{air}}\right)}{R_{\text{air}}}\right)$	rGO	TFT	1.2	RT	7	–	–	[42]
5L MoS2	n	M.E.	$\left(\frac{\left(R_{\text{gas}}-R_{\text{air}}\right)}{R_{\text{air}}}\right)$	Ti/Au	FET	1000	RT	1372	300	600	[17]
1L MoS2	n	CVD	$\left(\frac{\left(G_{\text{gas}}-G_{\text{air}}\right)}{G_{\text{air}}}\right)$	Ti/Au	FET	.02	RT	> 20	300	–	[36]
3L MoS2	p	CVD	$\left(\frac{\left(I_{\text{gas}}-I_{\text{air}}\right)}{I_{\text{air}}}\right)$	Al	Resistor	10	RT	80	–	–	[303]
2L MoS2	p	CVD	$\left(\frac{\left(I_{\text{gas}}-I_{\text{air}}\right)}{I_{\text{air}}}\right)$	Ag	Resistor	10	RT	98	–	–	[303]
4L MoS2	p	CVD	$\left(\frac{\left(I_{\text{gas}}-I_{\text{air}}\right)}{I_{\text{air}}}\right)$	Au	Resistor	10	RT	60	–	–	[303]
Atomic layered MoS2	n	CVD	$\left(\frac{\left(R_{\text{gas}}-R_{\text{air}}\right)}{R_{\text{air}}}\right)$	Ag	Resistor	50	RT	~ 120	–	–	[32]
Atomic layered MoS2	n	CVD	$\left(\frac{\left(R_{\text{gas}}-R_{\text{air}}\right)}{R_{\text{air}}}\right)$	Ag	Resistor	50	100	> 40	–	–	[32]
Few layer MoS2	p	L.E.	$\frac{R_{\text{gas}}}{R_{\text{air}}}$	Pt	Resistor	1	200	1.15	660	720	[31]
Few layer MoS2	n	L.E.	$\frac{R_{\text{gas}}}{R_{\text{air}}}$	Pt	Resistor	1	200	5.80	2460	2340	[31]
Vertical MoS2	p	CVD	$\left(\frac{\left(R_{\text{gas}}-R_{\text{air}}\right)}{R_{\text{air}}}\right)$	Ti/Au	Resistor	100	RT	> 10	–	–	[35]
Vertical MoS2	n	CVD	$\left(\frac{\left(R_{\text{gas}}-R_{\text{air}}\right)}{R_{\text{air}}}\right)$	Au/Cr	Resistor	50	RT	48.32	98	–	[304]
Vertical MoS2	n	CVD	$\left(\frac{\left(R_{\text{gas}}-R_{\text{air}}\right)}{R_{\text{air}}}\right)$	Au/Cr	Resistor	50	RT	24.26	34	132	[304]
2L MoS2	p	CVD	$\left(\frac{\left(R_{\text{gas}}-R_{\text{air}}\right)}{R_{\text{air}}}\right)$	Au	Resistor	1	RT	2.6	678	318	[305]
Mixed MoS2	p	CVD	$\left(\frac{\left(R_{\text{gas}}-R_{\text{air}}\right)}{R_{\text{air}}}\right)$	Au/Cr	Resistor	10	RT	10.36	8.51	–	[120]
Mixed MoS2	p	CVD	$\left(\frac{\left(R_{\text{gas}}-R_{\text{air}}\right)}{R_{\text{air}}}\right)$	Au/Cr	Resistor	10	125	7.79	4.44	19.6	[120]
MoS2 NWs	n	CVD	$\left(\frac{\left(R_{\text{air}}-R_{\text{gas}}\right)}{R_{\text{air}}}\right)$	Au	Resistor	5	60	18.1	16	172	[214]
MoS2 nanoflower	p	Hyd.	$\frac{R_{\text{gas}}}{R_{\text{air}}}$	Au	Resistor	50	150	78	–	–	[33]
MoS2 nanosphere/CTAB	n	Hyd.	$\left(\frac{\left(R_{\text{air}}-R_{\text{gas}}\right)}{R_{\text{air}}}\right)$	Ag/Pd	Resistor	50	150	60	15	12	[306]
MoS2 hollow microsphere	p	Hyd.	$\left(\frac{\left(R_{\text{air}}-R_{\text{gas}}\right)}{R_{\text{air}}}\right)$	Au/Cr	Resistor	100	150	40.3	79	225	[307]
MoS2 Nanoflowers	p	Hyd.	$\left(\frac{\left(R_{\text{air}}-R_{\text{gas}}\right)}{R_{\text{air}}}\right)$	Pt	Resistor	5	RT	67.4	125	485	[308]
MoS2 Nanoflowers	p	Hyd.	$\left(\frac{\left(R_{\text{air}}-R_{\text{gas}}\right)}{R_{\text{air}}}\right)$	Pt	Resistor	5	150	22	95	320	[308]
MoS2 Aerogel	p	T.D.	$\left(\frac{\left(R_{\text{gas}}-R_{\text{air}}\right)}{R_{\text{air}}}\right)$	Pt/Ti	Resistor	0.5	200	11	33	107	[24]
MoS2 Nanosheets	p	M.E.	$\frac{R_{\text{gas}}}{R_{\text{air}}}$	Ag/Pd	Resistor	100	RT	29	42	2	[309]
MoS2-W	n	Hyd.	$\left(\frac{\left(R_{\text{air}}-R_{\text{gas}}\right)}{R_{\text{air}}}\right)$	Ag/Pd	Resistor	20	RT	171	41	39	[121]
MoS2-Au	p	S.P.	$\left(\frac{\left(R_{\text{gas}}-R_{\text{air}}\right)}{R_{\text{air}}}\right)$	Au	Resistor	2.5	RT	30	240	840	[121]
rGO/Sv-MoS2	p	CVD	$\left(\frac{\left(R_{\text{gas}}-R_{\text{air}}\right)}{R_{\text{air}}}\right)$	Au	Resistor	50	50	72	56	328	[310]
MoS2	n	CVD	$\left(\frac{\left(R_{\text{gas}}-R_{\text{air}}\right)}{R_{\text{air}}}\right)$	Au	Resistor	50	50	27	142	–	[310]
Multi MoS2	n	CVD	$\left(\frac{\left(R_{\text{gas}}-R_{\text{air}}\right)}{R_{\text{air}}}\right)$	Au/Cr	Resistor	100	RT	27.92	249	–	[119]
Multi MoS2	n	CVD	$\left(\frac{\left(R_{\text{gas}}-R_{\text{air}}\right)}{R_{\text{air}}}\right)$	Au/Cr	Resistor	100	100	21.56	71	310	[119]
MoS2-Au NPs	p	Redox	$\left(\frac{\left(R_{\text{gas}}-R_{\text{air}}\right)}{R_{\text{air}}}\right)$	Au	Resistor	2.5	RT	30	240	840	[121]

Mechanical exfoliation (M.E.); liquid exfoliation (L.E.); electrochemical lithiation (E.L.); hydrothermal (Hyd.); thermal decomposition (T.D.); solution processed (S.P.)