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. 2020 Nov 13;76(Pt 12):1827–1831. doi: 10.1107/S2056989020014966

Table 3. Percentage contributions of inter­atomic contacts to the Hirshfeld surface for the title compound 4 .

Contact Percentage contribution
H⋯H 74.3
C⋯H/H⋯C 11.5
O⋯H/H⋯O 9.1
N⋯H/H⋯N 3.4
N⋯C/C⋯N 0.7
O⋯C/C⋯O 0.5
C⋯C 0.5