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Optimized deposition parameters for the epitaxial growth of different materials.
| Material | Substrate temperature (°C) | Oxygen pressure (mTorr) | Annealing temperature and time | Laser repetition (Hz) |
|---|---|---|---|---|
| BCT | 800 | 100 | 800 °C × 30 min | 7 |
| BZT | 800 | 100 | 800 °C × 30 min | 7 |
| SRO | 800 | 20 | 800 °C × 30 min | 7 |
