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. 2021 Jan 11;11:600069. doi: 10.3389/fpls.2020.600069

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Copyright © 2021 Zhang, Du, Han, Chen, Kong, Sun, Chen and Chen.

This is an open-access article distributed under the terms of the Creative Commons Attribution License (CC BY). The use, distribution or reproduction in other forums is permitted, provided the original author(s) and the copyright owner(s) are credited and that the original publication in this journal is cited, in accordance with accepted academic practice. No use, distribution or reproduction is permitted which does not comply with these terms.

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Cuticular wax coverage changes from Wuniuzao, 0202-10, and 0306A under well-watered control (C), water deprivation (WD), and rehydration (RE). (A) Total cuticular wax coverage changes from three tea germplasms under C, WD, and RE. (B) Epicuticular wax coverage from three tea germplasms under C, WD, and RE. (C) Intracuticular waxes coverage from three tea germplasms under C, WD, and RE. Data are expressed as mean ± SE (n = 4). Different letters within the same germplasm indicate statistical significance (P < 0.05).