Table 3.

Summary of DMA data (T _g: glass transition temperature determined from the maximum of tanδ, E′: storage modulus obtained 40 K above T _g where the system can be seen as relaxed) obtained after exposure of 2 min at 395 nm and 10 min at 805 nm with a radiation source emitting either 395 nm (1.1 W cm⁻²) or 805 nm (1.2 W cm⁻²) while the conversion degree at this time x _∞ was determined for the monomer polymerizing according to a cationic polymerization mechanism (cat) and/or radical polymerization mechanism. Thickness of the films was 120 μm.

Monomer (wt %)					805 nm exposure						395 nm exposure
M1	M2 a	M2 b	M4 a		x ∞ (cat)	x ∞(rad)	tanδ max	T g (°C)	E′ (MPa)		x ∞ (cat)	x ∞ (rad)	tanδ max	T g (°C)	E′ (MPa)
100	0	0	0		–	0.51	0.099	67	[a]
0	100	0	0		0.96	–	0.55	119	7
0	0	100			0.75	–	0.32	139	57
0	0	0	100		0.91	–	0.067 0.030	77 194	[b]		0.96	–	0.084	96 175
50	50	0	0		0.81	0.75	0.20	113	63		0.89	0.90	0.13 0.14	86 134	60
50	0	50	0		0.78	0.47	0.23	103	178
50	0	0	50		0.60	0.69	0.048	91 177	[b]		0.95	0.86	0.059	91 154 183	[b]
40	30	0	30		0.67/0.75	0.75	0.079	131	[b]
40	0	30	30		0.81/0.52	0.67	0.093	131 220	[b]

[a] Film broke, no data available. [b] Curve was not fully relaxed.