| Photon source parameters (50 keV) |
| RMS beam size (σ) (V × H) |
4.4 µm × 49.6 µm |
4.4 µm × 27.8 µm |
| Divergence (θ) (V × H) |
4.5 µrad × 105.5 µrad |
4.4 µrad × 6.8 µrad |
| Source 1 |
U22 undulator |
CPMU18 undulator |
| Length |
2 m |
1.5 m |
| Period |
22 mm |
18 mm |
| Maximum deflection parameter (K) |
1.788 |
1.75 |
| Total power (6 mm gap) |
6.9 kW |
7.4 kW |
| Source 2 |
|
W76 Wiggler |
| Length |
|
0.53 m |
| Period |
|
76 mm |
| Maximum deflection parameter (K) |
|
13.2 |
| Total power |
|
8.4 kW |
| Argon gas filter |
| Length |
1 m |
|
| Pressure |
350 mbar |
|
| Metal-coated diamond filters |
| Thickness (diamond) |
300 µm |
|
| Thickness (Cu) |
0.8–25.8 µm |
0.0–5.1 µm |
| Vertical focusing transfocator (TF1) |
| Distance from source |
32 m |
|
| Distance from sample |
33 m |
|
| Lenses apex radius |
100 µm |
|
| Lenses vertical geometrical aperture |
650 µm |
|
| Focused vertical FWHM at sample |
15 µm |
15 µm |
| Double multilayer monochromator (DMLM) |
| Materials |
[Ni93V7/B4C]500
|
|
|
d-spacing |
1.996 nm |
|
| Band-pass (ΔE/E) |
0.37% |
|
| Cooling |
Water |
|
| Energy range |
20–70 keV |
|
| Acceptance (20 keV) |
4 mm (V) and 4.5 mm (H) |
|
| Acceptance (95 keV) |
4 mm (V) and 1.0 mm (H) |
|
| Maximum flux density at sample (30 keV) (unfocused beam) |
4.2 × 1013 photons s−1 mm−2
|
∼8.5 × 1014 photons s−1 mm−2
|
| Laue–Laue monochromator |
| Lattice |
Si (111) or Si (311) |
|
|
d-spacing (111) |
3.1347 Å |
|
|
d-spacing (311) |
1.6370 Å |
|
| Bending radius |
30 m to ∞ |
|
| Band-pass (ΔE/E) |
0.01–1% |
|
| Cooling |
Liquid N2
|
|
| Energy range (111) |
40–180 keV |
|
| Energy range (311) |
80–250 keV |
|
| Acceptance |
2.0 mm (V) and 2.0 mm (H) |
|
| Maximum unfocused beam at sample |
1.2 mm × 6.4 mm (V × H) |
|
| Maximum flux density at sample (70 keV) (unfocused beam) |
4 × 1012 photons s−1 mm−2
|
∼1.3 × 1014 photons s−1 mm−2
|
| Horizontal focusing transfocator (TF2) |
| Distance from source |
53 m |
|
| Distance from sample |
12 m |
|
| Lenses radius |
100 µm |
|
| Lenses horizontal geometrical aperture |
650 µm |
|
| Focused vertical FWHM at sample |
35 µm |
18 µm |
| Microfocusing CRLs |
| Distance from source |
61–64 m |
|
| Distance from sample |
1–4 m |
|
| Lenses radius |
100 µm |
|
| Lenses horizontal geometrical aperture |
650 µm |
|
| Vertical beam size at sample |
0.5–2 µm |
0.5–2 µm |
| Horizontal beam size at sample |
3–9 µm |
1.5–5 µm |
| Kirkpatrick–Baez focusing mirrors |
| Distance from source |
64.38 m (V) and 64.65 m (H) |
|
| Distance from sample |
0.62 m (V) and 0.35 m (H) |
|
| Energy range |
20–69 keV |
|
| Output flux at 50 keV with DMLM |
1.5 × 1012 photons s−1
|
4.5 × 1013 photons s−1
|
| Acceptance |
0.3 mm (V) and 0.3 mm (H) |
|
| Beam size at sample (V × H) |
0.3 µm × 0.6 µm |
0.3 µm × 0.3 µm |
