Table 5.

Chemical composition ratio for C 1s, O 1s, and N 1s for the PAR–chitosan–GO thin film before and after contact with Co²⁺.

Sample	Element	Corrected RSF	Sub-Peak	Area	Corrected Area	Ratio (%)
PAR–chitosan–GO before contact with Co2+	C	1.2070	C–C	9491.2	7863.5	60.28
			C–O, C–O–C	4159.1	3445.8	26.41
			C=O, O–C=O	2095.1	1735.8	13.31
	O	3.1048	O–C, C–O–C	11,196.8	3606.3	70.50
			O=C	4685.2	1509.0	29.50
	N	2.0520	Pyridinic	442.4	214.6	19.41
			Amine	1705.1	830.9	74.79
			Pyrrolic	132.3	64.5	5.80
PAR–chitosan–GO after contact with Co2+	C	1.2070	C–C	7526.9	6236.0	48.68
			C–O, C–O–C	5985.3	4958.8	38.71
			C=O, O–C=O	1949.8	1615.4	12.61
	O	3.1048	O–C, C–O–C	14,541.3	4683.5	76.80
			O=C	4392.7	1414.8	23.15
	N	2.0520	Pyridinic	772	376.21	25.87
			Amine	1939.9	946.29	65.01
			Pyrrolic	272.1	132.60	9.12