Table 4.
Surface element analysis of Suprinity before and after etching with different acid concentrations and etching times (second)
| 5% hydrofluoric acid | 10% hydrofluoric acid | ||||||
|---|---|---|---|---|---|---|---|
| Elements (at%)* | 0s | 20s | 60 s | 120s | 20s | 60s | 120s |
| O2 | 76.83 | 73.80 | 74.78 | 72.18 | 72.44 | 68.20 | 74.52 |
| F | 0.03 | 0.03 | 0.03 | 0.03 | 0.05 | 0.02 | 0.05 |
| Al | 1.03 | 1.03 | 0.84 | 1.00 | 0.89 | 1.27 | 0.84 |
| Si | 18.85 | 21.37 | 20.79 | 22.65 | 22.51 | 25.55 | 20.86 |
| P | 0.59 | 1.03 | 1.11 | 1.21 | 1.41 | 1.31 | 0.95 |
| Zr | 2.48 | 2.62 | 2.41 | 2.76 | 2.64 | 3.48 | 2.75 |
| La | 00.00 | 0.12 | 0.03 | 0.17 | 0.06 | 0.15 | 0.03 |
*
at%: atomic percentage
O2: Oxygen; F: Fluoride; AL: Aluminium; Si: Silisium; P: Phosphor; Zr: Zirconium; La: lanthanum