Table 4.

Comparison of the Bi–Te thin film properties and growth methods published in the literature (since year 2011) with the present work.

References	Deposition method	Seebeck coefficient (µV/K)	Power factor (mW/m K2)
This work	Thermal evaporation	− 134	1.35
Ref21	Thermal evaporation	− 85	0.925
Ref28	Sputtering	− 85	1.14
Ref34	Sputtering	− 250	1.25
Ref41	Electrochemical deposition	− 58.3	0.35
Ref27	Sputtering	− 205	2.4
Ref39	Pulsed laser deposition	− 91	0.19
Ref42	Electrochemical deposition	− 110	1.093
Ref26	Sputtering	− 199	2.53
Ref57	MBE	− 182	0.9
Ref24	Sputtering	~  − 140	1.1
Ref29	Sputtering	− 160	0.72
Ref18	Thermal evaporation	− 132	0.605
Ref37	Sputtering	− 150	1.125
Ref31	Sputtering	− 193	0.97
Ref30	Sputtering	~  − 55	0.6
Ref59	Screen printing	− 138.4	0.192
Ref35	Sputtering	− 173	1.31
Ref33	Sputtering	− 92.4	0.709
Ref32	Sputtering	− 122	1.2
Ref60	Solution based synthesis	~  −150	0.89
Ref36	Sputtering	− 50	1.145
Ref19	Thermal evaporation	~ 200	1.020