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. 2021 Feb 1;15(2):3171–3187. doi: 10.1021/acsnano.0c09758

Table 1. Raman Fit Parameters from Figure 2d–g and Corresponding Defect Density, EF, and Strain.

  SLG on SiO2 SLG after Si3N4 deposition with hBN encapsulation SLG after Si3N4 deposition without hBN encapsulation
Pos(G) (cm–1) 1585.5 ± 0.7 1590.3 ± 1.5 1590 ± 1.6
FWHM(G) (cm–1) 10.5 ± 1.0 11.8 ± 1.7 12.0 ± 1.9
Pos(2D) (cm–1) 2678 ± 1.2 2684.6 ± 1.8 2679.3 ± 1.8
FWHM(2D) (cm–1) 26.9 ± 0.8 32.5 ± 1.5 33.8 ± 2
I(2D)/I(G) 2.6 ± 0.3 2.3 ± 0.3 1.8 ± 0.2
A(2D)/A(G) 6.8 ± 0.6 6.5 ± 0.7 5.1 ± 0.5
I(D)/I(G) <0.02 <0.05 0.48 ± 0.06
defect density (1011 cm–2) <0.05 <0.10 1.98 ± 0.3
EF (meV) 190 ± 30 220 ± 40 300 ± 40
uniaxial strain (%) –0.08 ± 0.08 0.06 ± 0.12 –0.14 ± 0.12
(biaxial strain) (%) (−0.03 ± 0.03) (0.02 ± 0.04) (−0.06 ± 0.05)